Eyring Materials Center

Description

Ellipsometry is a very sensitive surface and thin film measuring technique using polarized light to determine optical properties and thickness.

Measurement parameters can be customized to the sample to maximize data accuracy where the ellipsometric data is content-rich.

Thin Film Applications

• Semiconductors
• Optical coatings
• Dielectrics
• Metals
• Photovoltaics

Technical Details

• Spectral Range: 193-1690 nm (690 wavelengths)
• CCD detector
• Data acquisition rate: 0.05s; 2 to 5 s is typical
• Horizontal sample mount accommodates a wide variety of sample geometries and sizes
• Maximum sample thickness: 18 mm
• Minimum sample size is 1 cm x 1 cm

Characterization information

• General ellipsometry
  • Thickness
  • Index of refraction, n
  • Extinction coefficient, k
• Reflectance (R) intensity
• Transmission (T) intensity

Accessories

• Focusing probes
  • Allows small area measurement
  • Beam size reduced to 300 µm x 900 µm
• Environmental Cell – control the sample environment to study porous materials
  • A vapor delivery system creates a relative pressure environment using water under standard atmospheric conditions
  • Sample area 25 mm x 100 mm
  • Fixed 70º angle of incidenceThickness
• Fluid Cell – Study thin film optical properties in a liquid environment
  • Liquid capacity, 500µL
  • The dimension of substrates must exceed 25 mm X 9.1 mm²
  • Fixed 70º angle of incidence

Contact

Emmanuel Soignard
Operations Director
[email protected]
480.965.7242