Description
Atmospheric Plasma System is designed to process small samples and panels and wafers up to 330 mm and 300 mm respectively. The system is capable reduce the contact angle < 5 deg under a short period of time.
Techniques
- Plasma treatment
Atmospheric Plasma System is designed to process small samples and panels and wafers up to 330 mm and 300 mm respectively. The system is capable reduce the contact angle < 5 deg under a short period of time.

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