Semiconductor Device Processing

NanoFab

Semiconductor Device Processing Nanofab Equipment and Rates Cambridge Savannah ALD Deposition Tool

Cambridge Savannah ALD Deposition Tool

Description

The Savannah ALD tool is used to deposit thin layers of aluminum oxide (Al2O3), titanium oxide (O2Ti) and hafnium oxide (HfO2).

Learn more about thin film deposition technique and associated tools.

Techniques

  • Thin film deposition

Documents and manuals

Rates

Service or materialASU rateNonprofit or academic rateNotes
Equipment use$52.50/hrContact Nanofab for external rates.

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