Semiconductor Device Processing

Solar Fab

25. MRL furnace

Description

The MRL furnace is of the three tube configuration and accommodates 200 mm round substrates or 156 mm solar substrates in a diamond load configuration. One tube is used exclusively for dry thermal oxidation, and a second is dedicated to P diffusion via a liquid POCl3 source. Generic annealing in O2, N2, and H2N2 can be performed in the third tube.

Techniques

  • Dry thermal oxidation
  • POCl3 diffusion
  • Annealing

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