Description
Fiji is a high-vacuum plasma/thermal Atomic Later Deposition (ALD) system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The Fiji G2 is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition for substrates sizes up to 200 mm.
The system’s intuitive interface makes it easy to monitor and change recipes and processes as needed.
Fiji’s advanced features include:
- Proprietary Chamber Turbo Pumping System.
- Improved Plasma Design.
- Ergonomic Operator Interface.
- In-Situ Ellipsometry.
- Integrated Ozone.
- The Fiji is equipped with six precursor lines that can accommodate solid, liquid or gas precursors, and four plasma gas lines, offering significant experimental flexibility in a compact and affordable footprint.
Techniques
- Atomically precise, pinhole-free deposition
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