Description
The Octopus PECVD is the big brother, modern version of the P-5000 PECVD. Like the P-5000, the Octopus PECVD is a loadlocked, three-chamber system. Unlike the P-5000, the Octopus PECVD robotically transfers Gen III-sized plates which can be configured to process multiple substrates at once. One chamber each is dedicated to i a-Si:H, n a-Si: H (phosphine doping source), and p a-Si:H (trimethyl boron doping source).
Techniques
- PECVD
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