The Hitachi S-4700 FESEM is a scanning electron microscope used for detailed image analysis of devices and circuits fabricated in the NanoFab. Under ideal conditions, it can magnify images up to 500kX and can resolve features down to 2nm. It also is equipped with an energy dispersive x-ray analysis tool to identify elemental materials. The specimen stage is capable of tilting up to 60 degrees with full 360 degrees in a continuous rotation and can accommodate a sample up to 100mm in diameter. The beam accelerating voltage is variable from 0.5-30 keV.
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