| AS-One 100 RTP |
rapid thermal processing |
| AS-One 150 RTP |
rapid thermal processing |
| Cambridge Savannah ALD Deposition Tool |
Thin film deposition |
| CEE Spin Coater #1 and #2 |
Lithography |
| CHA E-Beam Evaporator |
Thin film deposition |
| Edwards2 Thermal Evaporator |
Thin film deposition |
| Elionix ELS-BODEN 100keV Electron Beam Lithography |
Lithography |
| EVG 620 Aligner |
Lithography |
| Filmetrics F20 and F40 |
Optical reflectometry |
| Heidelberg MLA-150 |
Lithography |
| Hitachi S-4700 Field Emission Scanning Electron Microscope |
Characterization |
| Lesker #1 Sputter Deposition Tool |
Thin film deposition |
| Lesker #2 Sputter Deposition Tool |
Thin film deposition |
| Lesker #3 E-Beam Evaporator |
Thin film deposition |
| Lesker #4 E-Beam Evaporator |
Thin film deposition |
| Lesker #5 Sputter Deposition Tool |
Thin film deposition |
| OAI 808 Aligner |
Lithography |
| Oxford PECVD |
Thin film deposition |
| PlasmaLab M80 Plus – Chlorine |
Dry etch, reactive ion etching |
| PlasmaLab M80 Plus – Fluorine |
Dry etch, reactive ion etching |
| PlasmaTherm 790 RIE – Fluorine |
Dry etch, reactive ion etching |
| PlasmaTherm Apex ICP |
Dry etch, Inductively coupled plasma etching |
| SCS Spin Coater |
Lithography |
| STS AGE ICP - Chlorine |
Dry etch, Inductively coupled plasma etching |
| STS ASE ICP DRIE – Fluorine |
Dry etch, Inductively coupled plasma etching |
| Tegal 421 |
Dry etch, reactive ion etching, barrel ashing |
| Xactix XeF2 Si Etcher |
Dry etch, dry vapor phase etching |
| Zygo ZeGage |
Characterization, 3D optical profiling |
