Description
The Lesker #3 tool is an electron beam evaporation system utilizing a four pocket hearth. The tool has a 12” platen to load up to five 4” substrates. The evaporator has the ability to evaporate silver (Ag), aluminum (Al), gold (Au), chromium (Cr), copper (Cu), germanium (Ge), molybdenum (Mo), nickel (Ni), nichrome (NiCr), palladium (Pd), platinum (Pt), silicon (Si), titanum (Ti), vanadium (V), Vi and tungsten (W) materials. The evaporator has the ability to deposit dielectrics such as aluminum oxide (Al2O3) and silicon dioxide (SiO2). This evaporator has restrictions for zinc (Zn) and zinc oxide (ZnO) materials.
Learn more about thin film deposition technique and associated tools.
Techniques
- Thin film deposition
Documents and manuals
- FileLesker #3 SOP Rev M.pdf1.17 MB
ASU Unit
Knowledge Enterprise
Rates
Service | ASU Internal Rate | External Organization Rate | Notes |
---|---|---|---|
Equipment use | $52.5/ Hour | Contact NanoFab |
Photos