Description
The Lesker #4 tool is an electron beam evaporation system utilizing a four pocket hearth. The tool has a 12” platen to load up to five 4” substrates. The evaporator currently has the ability to evaporate aluminum (Al), aluminum silicon (Al/Si), chromium (Cr), molybdenum (Mo), nickel (Ni), palladium (Pd), platinum (Pt), silicon (Si) and titanum (Ti) metal materials. It also has the ability to deposit dielectrics films such as aluminum oxide (Al2O3) and silicon dioxide (SiO2). This evaporator has restrictions for gold (Au), silver (Ag), copper (Cu), zinc (Zn) and zinc oxide (ZnO) materials.
Learn more about thin film deposition technique and associated tools.
Techniques
- Thin film deposition
Documents and manuals
- FileLesker 4 ebeam SOP_REV D.pdf435.92 KB
ASU Unit
Knowledge Enterprise
Rates
| Service | ASU Internal Rate | External Organization Rate | Notes |
|---|---|---|---|
| Equipment use | $52.5 per Hour | Contact NanoFab |
Photos
