Description
The Nanometrics reflectometer is used for measurement of thickness of thin films on silicon substrates. The equipment works in the visible spectra, and the measurement requires the knowledge of the refractive index value. The spatial resolution is 10 µm, thereby providing the capability of measuring the spatial uniformity of the thickness of the deposited film. Silicon dioxide, silicon nitride, and photoresist are typical films that can be measured.
Location: MTW - MacroTechnology Works, cleanroom 2213
Techniques
- Film thickness characterization
ASU Unit
Knowledge Enterprise
Photos
