Description
This is the spin rinse dryer configured for 156 mm substrates and that supports substrates that were processed in the adjacent hoods (Acid/solvent hood, Acid hood 1, Acid hood 2, and the Piranha hood).
Location: MTW - MacroTechnology Works, cleanroom 2213
Techniques
- Final substrate rinsing and drying after wet processing
ASU Unit
Knowledge Enterprise
Photos
