58. Semitool SRD

Description

This spin rinse dryer is configured for 156 mm substrates and is proximal to the Octopus PECVD tool for final rinsing and drying after native oxide strip.

Location: MTW - MacroTechnology Works, cleanroom 1323

Techniques
  • Final substrate rinsing and drying after wet processing
ASU Unit
Knowledge Enterprise
Photos
56. Semitool SRD