Description
The MRL furnace is of the three tube configuration and accommodates 200 mm round substrates or 156 mm solar substrates in a diamond load configuration. One tube is used exclusively for dry thermal oxidation, and a second is dedicated to P diffusion via a liquid POCl3 source. Generic annealing in O2, N2, and H2N2 can be performed in the third tube.
Location: MTW - MacroTechnology Works, cleanroom 2213
Techniques
- Dry thermal oxidation
- POCl3 diffusion
- Annealing
ASU Unit
Knowledge Enterprise
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