Description
The Octopus PECVD is the big brother, modern version of the P-5000 PECVD. Like the P-5000, the Octopus PECVD is a loadlocked, three-chamber system. Unlike the P-5000, the Octopus PECVD robotically transfers Gen III-sized plates which can be configured to process multiple substrates at once. One chamber each is dedicated to i a-Si:H, n a-Si: H (phosphine doping source), and p a-Si:H (trimethyl boron doping source).
Location: MTW - MacroTechnology Works, cleanroom 1323
Techniques
- PECVD
ASU Unit
Knowledge Enterprise
Photos
![Octopus PECVD](/sites/default/files/2022-05/220408-SolarFab-Equipment-509-35.jpg)