This is one of the hoods in the Solar Fab specifically designated to a defined chemistry, more generically in this case to III-V processing. The GaAs chemical etch bench system consists of the etch bench in the lab, and the following equipment in the sub-fab: an acid waste collection cabinet; a caustic waste collection cabinet; and an ion exchange system for arsenic collection which can not be disposed of normally through the MTW waste stream. Mixed acid solutions (e.g., HCl, H3PO4, and H2SO4) can be used on the left side of the hood and caustic process solutions (e.g., NH4OH and H2O2) must be used on the right side of the hood. The hood has two rinse tanks, a quick dump rinser, a DIW gun, and an N2 gun.
Location: MTW - MacroTechnology Works, cleanroom 2214
- Wet chemical processing
