6 inch Wet Etch Hood

Description

Wet chemical processes
Wafer cleaning is commonly the first step and may be used repeatedly throughout a process fabrication sequence. This may involve the use of acid and basic solutions, followed by a water rinse.

Cleans are designed to remove organic or metallic surface contamination as well as particulates. Furnace pre-cleans consist of a Piranha clean followed by silicon clean 1(SC1) and then silicon clean 2(SC2). Short etch steps are often done prior to metallization to ensure good contacts to semiconductors. Micro Electro-Mechanical Systems (MEMS) processes can utilize a long buffered oxide etches (BOE) for the release step.

Wet chemical etching is available with the following chemicals:     

  1. Buffered oxide etch (BOE = NH4F + HF) and HF solutions (such as 10 parts H2O + 1 part 49%HF)   
  2. NH4OH + DI H20
  3. DIH2O + HNO3 + H3PO4 + C2H4O2 (Moly and Al Etching)
  4. DIH2 + HNO3 + HCL  ( ITO Etching)
  5. PCT Megasonic clean (can be used with Detergent8 soap or without)
  6. Each chemical tank has a QDR rinse tank associated with it.
  7. Spin Rinse Dryer to Dry the wafers after rinse

Solvent Hood    

  1. SRS Solvent Strip chemistry 

Equipment and hoods    

  1. One acid hood 
  2. One solvent hood
  3. Other chemistries can be used. Please check with FEDC staff.
Techniques
  • Wafer cleaning
ASU Unit
Knowledge Enterprise
Rates
Service ASU rate Nonprofit/other academic rate Notes
Equipment use $40/hour $48/hour  
We welcome industry customers! Contact us to find out our current rates.