Equipment

Equipment Techniques
6 inch Solvent hood solvent cleaning
6 inch Wet Etch Hood Wafer cleaning
AlWin21 RTP rapid thermal processing
AMAT 8330 Etching
Amerimade Acid Hood Wet Etching
Applied Materials AKT1600 Reactive ion etching of various layers and thicknesses of dielectrics and metals, Plasma enhanced chemical vapor deposition
Applied Materials P5000 Plasma enhanced chemical vapor deposition
Azores 5200 Stepper Photolithography
Bagging Station Parts Bagging Station
Camera Equipped Microscope Optical Microscopy
Canon MPA-600 FA Photolithography
CEE Model 300 Spin Coater Spin coating
CHA Metal Evaporator e-beam evaporation
CHA TCO Evaporator SR-10 Evaporation deposition
Cole-Parmer Hot Plate Heating
CURTIS Laser Repair Metrology
Despatch Oven Photolithography
Diener Asher Oxygen plasma processing
Dimatix DMP-2831 Materials Inkjet Printer Inkjet Printing
DYMAX 2000 UV Curing Flood Lamp Bonding, Curing of photosensitive materials
DYMAX 5000 UV Flood Lamp Bonding, Curing of photosensitive materials
Ecopia Hall Effect Measurement System hall measurement
EIT Ashing, Photoresist removal
Electroglas 2001x Probe System Semiconductor wafer probing
EVG 150 Developer - DI Rinse Cleaner Photolithography
EVG 610 Mask Aligner UV Exposure/Mask Alignment
EVG501 Bonder Wafer bonding
Explorer Pro Scale mass measurement
Filmetrics F50 Reflectometry
Flex Tester Photolithography
FP-10 Stylus Profilometer Accurate profile measuring
Gasonics L3510 Ashing, Photoresist removal
GEN II Acid and Base Hood Wafer cleaning
GEN II Bow Warp Laser flatness measuring
Gen II Custom Probe System Electrical testing
GEN II Solvent Tool Wafer cleaning
Imada PEEL Tester MV-110 Peel testing
JEOL 6300F FESEM Field emission scanning electron microscopy
Jinlong PEEL Tester Peel testing
KDF-744 Batch-sputtering
KLA Tencor Omnimapper 4 Point Probe 4 point probe
Kruss DSA20E Easy Drop Goniometer/Contact Angle Measurement Goniometer/Contact Angle
LanTec UV-ozone Cleaner Exposure Dry cleaning of organic contaminants from glass substrates
Laurell WS400B Spin Coater Spin coating
Micro Manipulator 4060 Manual analytical probing
Mini Brute Tube Furnace - Model MB-80 Oxidation, Annealing, Alloying
MRC-603A Thin film metal deposition
MRC-603B Thin film metal deposition
Nanometrics RPM 2000 Photoluminescence Mapper Photoluminescence
Nomarski Contrast Microscope differential interference contrast microscopy, Nomarski microscopy
nTact Advantage II Slot Die Coater photoresist coating, polyimide coating
Olympus MHL110 Microscope Microscopy
Orbotech FPI-7098 Metrology
Park XE-150 Atomic Force Microscope atomic force microscopy
Prism Ultra-Coat 300 Photolithography
Rite Track (SVG) 8600 Coater and Developer Track Photolithography
Rite Track (SVG) 8800 Coater and Developer Track Photolithography
Sartorius Scale mass measurement
Solvent hood Solvent Processing
Sun-Tec Laminator Lamination, Bonding
Sunic Sunicel 400 Metal deposition , Organic deposition
Tamar WaferScan Wafer Flatness
Tegal 901e plasma etching
Tegal 903e plasma etching
Tegal 965 Ashing
Tencor 6200 SurfScan Defect Scanner wafter defect inspection
Tencor FLX-2350FP Fim stress measurement
Tencor P-16 Profilometer Surface topography measuring
Tencor P2 Profilometer Profilometry
Thermo Nicolet 6700 FTIR Fourier Transform Infrared Spectroscopy
VWR Hot Plate Heating
Western Magnum XRL180 Laminator Dry film lamination
Woollam Ellipsometer M2000 Ellipsometry
Yamato DP43 Vacuum Bake Oven Vacuum pressure curing and baking
Yamato DP63 Vacuum Bake Oven Vacuum pressure curing and baking
YES Vapor Prime Oven HMDS Vapor Prime Oven
YES – FPO HMDS Vapor Prime Photolithography, Vacuum bake HMDS vapor priming