The AlWin21 RTP is a rapid thermal processing system capable of quickly heating substrates to 1000°C using halogen lamps and a controlled inert gas. Both a thermocouple and a pyrometer are installed for accurate temperature measurement. This system is configured for two mass flow control purge gasses. Current gas configuration is oxygen (O2) or nitrogen (N2) forming gas. The quartz chamber is loaded with substrates contained in a susceptor. The susceptor allows sizes from pieces to 6” wafers. The Susceptor also allows for more uniform thermal distribution. Susceptors of different shapes can be manufactured for special projects.
- rapid thermal processing