The AlWin21 RTP is a rapid thermal processing system capable of quickly heating substrates to 1000°C using halogen lamps and a controlled inert gas. Both a thermocouple and a pyrometer are installed for accurate temperature measurement. This system is configured for 2 mass flow control purge gasses. Current gas configuration is O2, N2 or forming gas. The quartz chamber is loaded with substrates contained in a susceptor. The susceptor allows sizes from pieces to 6” wafers. The Susceptor also allows for more uniform thermal distribution. Susceptors of different shapes can be manufactured for special projects.
- rapid thermal processing