Description
The YES vapor prime oven is used for substrate coating of an adhesion promotor before coating with photoresist. Vacuum evacuation occurs before introducing the chemical vapor to the heated oven. The system is currently configured to use HMDS. The system has the ability to be reprogrammed for controlled vacuum baking of parts, pieces, and wafers up to 200C. System chamber is spacious enough to accommodate up to a 300mm substrate.
Techniques
- HMDS Vapor Prime Oven
ASU Unit
Knowledge Enterprise
