Equipment

Equipment Techniques
AS-One 150 RTP rapid thermal processing
Cambridge Savannah ALD Deposition Tool Thin film deposition
CEE Spin Coater #1 and #2 Lithography
CHA E-Beam Evaporator Thin film deposition
Edwards2 Thermal Evaporator Thin film deposition
EVG 620 Aligner Lithography
Filmetrics F20 and F40 Optical reflectometry
GCA 8500 5X Stepper Lithography
Heat Pulse RTP rapid thermal processing
Hitachi S-4700 Field Emission Scanning Electron Microscope Characterization
JEOL JBX-6000 FS/E Electron Beam Lithography Lithography
Lesker #1 Sputter Deposition Tool Thin film deposition
Lesker #2 Sputter Deposition Tool Thin film deposition
Lesker #3 E-Beam Evaporator Thin film deposition
Lesker #4 E-Beam Evaporator Thin film deposition
Lesker #5 Sputter Deposition Tool Thin film deposition
OAI 808 Aligner Lithography
Oxford PECVD Thin film deposition
PlasmaLab M80 Plus – Chlorine Dry etch, reactive ion etching
PlasmaLab M80 Plus – Fluorine Dry etch, reactive ion etching
PlasmaTherm 790 RIE – Fluorine Dry etch, reactive ion etching
PlasmaTherm Apex ICP Dry etch, Inductively coupled plasma etching
SCS Spin Coater Lithography
STS AGE ICP - Chlorine Dry etch, Inductively coupled plasma etching
STS ASE ICP DRIE – Fluorine Dry etch, Inductively coupled plasma etching
Tegal 421 Dry etch, reactive ion etching, barrel ashing
Xactix XeF2 Si Etcher Dry etch, dry vapor phase etching
Zygo ZeGage Characterization, 3D optical profiling